Thin Film Chemical Vapor Deposition in Integrated Circuit Technology: Equipment, Methodology and Thin Film Growth Experience

15.09.2014

Монография. Vasilyev V.Yu. Thin Film Chemical Vapor Deposition in Integrated Circuit Technology: Equipment, Methodology and Thin Film Growth Experience / Nova Science Publishers, Inc., 2013, p.p.1-314.

This monograph is a summary of equipment, methodology and thin film growth experience obtained by the author during his 30 years of research work in the field of Integrated Circuit (IC) device technology. The monograph is concerned with the analysis of different aspects of different types of inorganic thin films grown by Chemical Vapor Deposition (CVD) methods and dedicated to the use in IC technology and production. The author discusses the methodology issues of thin film CVD and the fundamentals of the chemical kinetics of thin film growth. The main core of this monograph is the analysis of thin film CVD kinetics features obtained using different types of reactors, chemical compounds, process conditions.

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